TDUR™-P3435光刻胶TOK

KrF胶有TDUR系列TDUR-1.P4197T PM

2.TDUR-P9001 CO

3.TDUR™-P3435

Substrate

BARC

Film Thickness

430nm(R.I.:1.56@633nm)

Pre-bake

90℃, 60sec

Exposure

KrF stepper (NA: 0.75, σ: 2/3 annular)

Mask

TOK Reticle (HT 6%)

P.E.B

110℃, 60s

Development

NMD-3 2.38%, 60s, Paddle