TARF-P6111光刻胶TOK
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面议
及时发货
交易保障
卖家承担邮费
Substrate
BARC on Si
Resist Thickness
250nm
P.A.B
130℃, 60sec
Exposure
ArF stepper
Exposure Condition
NA: 0.85, σ: 0.60
True Camphor
Binary
P.E.B
130℃, 60sec
Development
TMAH 2.38%, LD nozzle, 30sec