SN1300系列厚膜光刻胶SN1350

SN1300 系列厚膜光刻胶是一种环氧

固化厚膜负性光刻胶，主要应用于光电子芯

片、MEMS 及半导体封装等领域。该材料经高

温固化后可以作为绝缘材料保留在芯片内，

具有较好的机械强度及透光性能；

INTRODUCTION

SN1300 series PR is a kind of thick

film negative Epoxy photoresist,mainly used

in IC manufacture such as optoelectronic

chips,MEMS and semiconductor packaging. the material can be retained in the chip as an

insulating material and has good strength &

light transmission performance，After cured at

high temperature;

产品性能

 膜厚 0.5-100μm；

 高对比度，适用于≥5:1 高深宽比图形；

 高曝光灵敏度（80-250mj/cm

2）；

 良好工艺兼容性；

 平坦化性能。

FEATURES

 The thickness range of SN1300 series：

0.5-100μm;

 High contrast&fit for high aspect ratio

lithography ≥5:1;

 High sensitivity（80-250mj/cm2）;

 Good process compatibility;

 Excellent coating performance;

产品型号 PRODUCT RANGE

Spin Curve Pattern Profiles

Product Name SNT150 SN1350 SN1330 SN1320 SN1310 SN1305

Film thickness 80-150um 60-80um 30-60um 13-30um 8-15um 3-7um